What is the smallest feature possible on your masks?
The minimum feature, which can be resolved on a mask, depends on the technology of the writing tool and the mode in which the tool is used, as well as the resist and process chemistry used.
| Writing Tool | Writing Mode | Resist | Etch Method | Minimum Features |
|---|---|---|---|---|
| CORE 2564 | 2-Pass | IP3500 | Wet Etch | 1.5um lines 2.1um contacts |
| CORE 2564 | 4-Pass | IP3500 | Wet Etch | 0.8um lines 1.6um contact |
| ALTA 3100 | 4-Pass | IP3500 | Wet Etch | 0.7um lines 1.4um contacts |
| MEBES 5500 | various | ZEP | Dry Etch | 0.5um lines |
Note that MEBES 5500 photomasks are only available in 6"x6"x250 materials with a dry etch process. This makes these photomasks a more expensive option. Smaller contacts (features) can be manufactured on the 5500 system using Phase Shift Masks, also a more expensive option than using normal Chrome masks.