What is a Photomask?

So What is a Photomask?

A photomask is a quartz or glass substrate, coated with an opaque film in to which is etched the design of the device being manufactured.

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While photomasks have a variety of applications, the majority are used to support the microlithography process our customers use.

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They are made by exposing or writing the device designer’s pattern on to a resist coated chrome blank photomask.

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Photomasks were first used to support the manufacture of integrated circuits in the 1960s and 70s. They have come a long way since then.

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This section contains information about the various types of photomasks and how they are used.

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