Making a Photomask
A photomask is made by exposing, or writing, the designer’s pattern onto a resist coated chrome mask blank. The latent image in the resist is then developed to form the required pattern.
This resist image acts as a mask during the etching process. The pattern is transferred into the chrome film when the resist layer is removed.
CD’s and pattern placement are measured to ensure they meet our customer’s specifications. The pattern is then inspected for any defects that may affect device functionality, which are repaired if necessary.
A final clean, and if required, a protective pellicle is attached to complete the photomask manufacturing process.