Our Photomask Cleaning Service
Maintaining mask quality is a challenge and while photomasks are robust, they are not indestructible. The lithography processes used by our customers, regardless of sector, demand that the mask has a level of pattern integrity that enables devices to be manufactured without any imperfections which may affect performance.
As an integral part of our manufacturing process, photomask cleaning is essential to remove soft defects from the chrome and clear areas of the mask.
How do we do it?
Our cleaning processes combine both chemical and physical methods. A mixture of Sulphuric Acid and Hydrogen Peroxide is used to remove photoresist and organic contaminants.
Our UK and US facilities use purpose designed automatic single substrate mask cleaning tools such as the HMR900 or the ASC500.
If you would like to learn more about our photomask cleaning service then please get in touch.